A Look At Samsung’s 4LPE Process
As Samsung readies its 3-nanometer process node which will introduce a new device architecture, we look at their last FinFET-based process technology - the 4-nanometer process. Though not groundbreaking by any measure, the 4LPE node features the shortest cells reported to date - albeit not the densest. Perhaps most interestingly, with the introduction of this node, Samsung is now on equal footing with TSMC and Intel in terms of cell scaling boosters.
This article is reserved for our subscribers.
In addition to our usual, free, coverage of cutting-edge semiconductor technologies and state-of-art chips, a subscription offers exclusive, early access to additional articles such as this one. Learn more here.