Process Technologies

Intel Talks 10nm DTCO, EUV Benefits

June 22, 2021June 22, 2021 David Schor 10 nm, 5 nm, 7 nm, EUV, IEDM, IEDM 2020, Intel, subscriber only (general)

Intel talks 10-nanometers DTCO and the benefits of EUV on their future 7 nm and 5 nm nodes.

Foundries IEDM 2020 Process Technologies Roadmaps Subscriber Only Content

Samsung Details 5nm and 4nm; Adds 8LPA, 5LPP, and 4LPP Nodes; Readies 3nm GAA For Next Year

May 21, 2021May 23, 2021 David Schor 3 nm, 4 nm, 4LPE, 4LPP, 5 nm, 5LPE, 5LPP, 7 nm, IEDM 2020, Samsung, Samsung Foundry, subscriber only (general)

Samsung revealed more details of its 5LPE process technology which recently ramped, gave a roadmap status update along with new stop-gap nodes announcement.

Interconnects Packaging Process Technologies

Left, Right, Above, and Under: Intel 3D Packaging Tech Gains Omnidirectionality

May 17, 2020May 23, 2021 David Schor 2.5D packaging, 3D packaging, Co-EMIB, EMIB, Foveros, Intel

A look at ODI, a new family of packaging interconnect technologies that bridges the gap between Intel’s EMIB (2.5D) and Foveros (3D) by providing the flexibility of an EMIB in 3D with additional benefits of thermal & power.

Foundries Process Technologies Roadmaps

TSMC Ramps 5nm, Discloses 3nm to Pack Over a Quarter-Billion Transistors Per Square Millimeter

April 17, 2020May 25, 2021 David Schor 3 nm, 5 nm, FinFET, N3, N5, N5P, N7, N7P, TSMC

TSMC reports a flat Q1 amid the COVID-19 pandemic, ramps its 5nm node with good yield and discloses key 3-nanometer (N3) details. N3 will be a full node jump over N5 and is expected to offer over a quarter-billion transistors per each millimeter square of silicon.

Foundries IEDM 2019 ISSCC 2020 Process Technologies

TSMC Details 5 nm

March 21, 2020May 25, 2021 David Schor 5 nm, 7 nm, EUV, N5, N5P, TSMC

TSMC details its 5-nanometer node for mobile and HPC applications. The process features the industry’s highest density transistors with a high-mobility channel and highest-density SRAM cells.

Interconnects Packaging Process Technologies

TSMC Announces 2x Reticle CoWoS For Next-Gen 5nm HPC Applications

March 3, 2020May 25, 2021 David Schor 2.5D packaging, 5 nm, 7 nm, CoWoS, interposer

TSMC announces an enhancement to its CoWoS packaging technology with support for up to 2x the reticle size. The new technology is ready for next-generation 5-nanometer HPC applications.

IEDM 2019 Interconnects Packaging Process Technologies

TSMC Digs Trenches In Search Of Higher Performance

December 14, 2019May 25, 2021 David Schor 2.5D packaging, CoWoS, DTC, IEDM, IEDM 2019, MiM, TSMC

TSMC leverages existing silicon in the CoWoS process to improve the power delivery system of high-performance applications through new, deep trench capacitors, codename iCAPs.

Foundries Process Technologies

UMC Rolls Out 22-Nanometer

December 13, 2019May 25, 2021 David Schor 22 nm, 22ULL, 22ULP, 28nm, 40 nm, UMC

UMC says it has started rolling out its 22-nanometer planar process, offering a new lower-power and cost-sensitive migration path from existing 40nm and 28nm nodes.