As Samsung readies its 3-nanometer process node which will introduce a new device architecture, we look at their last FinFET-based process technology - the 4-nanometer process. Though not groundbreaking by any measure, the 4LPE node features the shortest cells reported to date - albeit not the densest. Perhaps most interestingly, with the introduction of this node, Samsung is now on equal footing with TSMC and Intel in terms of cell scaling boosters.
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